Pattern Generation by Using Multistep Room-Temperature Nanoimprint Lithography
نویسندگان
چکیده
منابع مشابه
Pattern Generation Using Multi-Step Room-Temperature Nanoimprint Lithography
We have demonstrated multi-step room-temperature nanoimprint lithography (RTNIL) using polystyrene (PS, average molecular weight 97 kg/mol) as the polymer layer for imprinting complex patterns. Our motivation in pursuing multi-step RTNIL is to create a new pattern-generation method, able to create complex and arbitrary patterns without requiring a custom template for each new pattern. A variety...
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ژورنال
عنوان ژورنال: IEEE Transactions on Nanotechnology
سال: 2007
ISSN: 1536-125X
DOI: 10.1109/tnano.2007.907769